Open access peer-reviewed Edited volume

Recent Advances in Nanofabrication Techniques and Applications

Edited by Bo Cui

University of Waterloo, Canada

Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.

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Recent Advances in Nanofabrication Techniques and ApplicationsEdited by Bo Cui

Published: December 2nd 2011

DOI: 10.5772/859

ISBN: 978-953-307-602-7

Copyright year: 2011

Books open for chapter submissions

83522 Total Chapter Downloads

13 Crossref Citations

40 Web of Science Citations

47 Dimensions Citations

chaptersDownloads

Open access peer-reviewed

1. Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch

By Sumio Hosaka

2598

Open access peer-reviewed

2. Focused Ion Beam Lithography

By Heinz D. Wanzenboeck and Simon Waid

9249

Open access peer-reviewed

3. Atom Lithography: Fabricating Arrays of Silicon Microstructures Using Self-Assembled Monolayer Resist and Metastable Helium Beam

By Jianwu Zhang, Zhongping Wang and Zengming Zhang

2285

Open access peer-reviewed

4. Character Projection Lithography for Application-Specific Integrated Circuits

By Makoto Sugihara

1666

Open access peer-reviewed

5. Transform-Based Lossless Image Compression Algorithm for Electron Beam Direct Write Lithography Systems

By Jeehong Yang and Serap A. Savari

1663

Open access peer-reviewed

6. Ultrafast Fabrication of Metal Nanostructures Using Pulsed Laser Melting

By Bo Cui

2395

Open access peer-reviewed

7. Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale

By Andrea Cattoni, Jing Chen, Dominique Decanini, Jian Shi and Anne-Marie Haghiri-Gosnet

2830

Open access peer-reviewed

8. Repairing Nanoimprint Mold Defects by Focused-Ion-Beam Etching and Deposition

By Makoto Okada and Shinji Matsui

1955

Open access peer-reviewed

9. Improving the Light-Emitting Efficiency of GaN LEDs Using Nanoimprint Lithography

By Yeeu-Chang Lee and Sheng-Han Tu

6120

Open access peer-reviewed

10. Fabrication of Circular Grating Distributed Feedback Dye Laser by Nanoimprint Lithography

By Yan Chen, Zhenyu Li, Zhaoyu Zhang and Axel Scherer

2514

Open access peer-reviewed

11. Application of Nanoimprint Lithography to Distributed Feedback Laser Diodes

By Masaki Yanagisawa

2654

Open access peer-reviewed

12. Guided-Mode Resonance Filters Fabricated with Soft Lithography

By Kyu J. Lee, Jungho Jin, Byeong-Soo Bae and Robert Magnusson

2505

Open access peer-reviewed

13. DUV Interferometry for Micro and Nanopatterned Surfaces

By Olivier Soppera, Ali Dirani, Fabrice Stehlin, Hassan Ridaoui, Arnaud Spangenberg, Fernand Wieder and Vincent Roucoules

2077

Open access peer-reviewed

14. Ultrashort Pulsed Lasers – Efficient Tools for Materials Micro-Processing

By Marian Zamfirescu, Magdalena Ulmeanu, Alina Bunea, Gheorghe Sajin and Razvan Dabu

2373

Open access peer-reviewed

15. Laser-Based Lithography for Polymeric Nanocomposite Structures

By Athanassia Athanassiou, Despina Fragouli, Francesca Villafiorita Monteleone, Athanasios Milionis, Fabrizio Spano, Ilker Bayer and Roberto Cingolani

2574

Open access peer-reviewed

16. Fabrication of 3-D Structures Utilizing Synchrotron Radiation Lithography

By Mitsuhiro Horade and Susumu Sugiyama

2023

Open access peer-reviewed

17. Emerging Maskless Nanolithography Based on Novel Diffraction Gratings

By Guanxiao Cheng, Yong Yang, Chao Hu, Ping Xu, Helun Song, Tingwen Xing and Max Q.-H. Meng

1921

Open access peer-reviewed

18. Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target

By Sho Amano

1997

Open access peer-reviewed

19. Irradiation Effects on EUV Nanolithography Collector Mirrors

By J.P. Allain

2473

Open access peer-reviewed

20. High-Index Immersion Lithography

By Keita Sakai

2707

Open access peer-reviewed

21. Double Patterning for Memory ICs

By Christoph Ludwig and Steffen Meyer

4881

Open access peer-reviewed

22. Diffraction Based Overlay Metrology for Double Patterning Technologies

By Prasad Dasari, Jie Li, Jiangtao Hu, Nigel Smith and Oleg Kritsun

4249

Open access peer-reviewed

23. Nanolithography Study Using Scanning Probe Microscope

By S. Sadegh Hassani and H. R. Aghabozorg

2354

Open access peer-reviewed

24. Scanning Probe Lithography on Organic Monolayers

By SunHyung Lee, Takahiro Ishizaki, Katsuya Teshima, Nagahiro Saito and Osamu Takai

1884

Open access peer-reviewed

25. Controlled Fabrication of Noble Metal Nanomaterials via Nanosphere Lithography and Their Optical Properties

By Yujun Song

1948

Open access peer-reviewed

26. A Feasible Routine for Large-Scale Nanopatterning via Nanosphere Lithography

By Zhenyang Zhong, Tong Zhou, Yiwei Sun and Jie Lin

2414

Open access peer-reviewed

27. Electrohydrodynamic Inkjet – Micro Pattern Fabrication for Printed Electronics Applications

By Kyung-Hyun Choi, Khalid Rahman, Nauman Malik Muhammad, Arshad Khan, Ki-Rin Kwon, Yang-Hoi Doh and Hyung-Chan Kim

5143

Open access peer-reviewed

28. Lithography-Free Nanostructure Fabrication Techniques Utilizing Thin-Film Edges

By Hideo Kaiju, Kenji Kondo and Akira Ishibashi

1640

Open access peer-reviewed

29. Extremely Wetting Pattern by Photocatalytic Lithography and Its Application

By Yuekun Lai, Changjian Lin and Zhong Chen

2430

Edited volume and chapters are indexed in

  • Worldcat
  • OpenAIRE
  • Google Scholar
  • AZ ebsco
  • Base
  • CNKI
  • IET Inspec

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