Recent Advances in Nanofabrication Techniques and Applications

Bo Cui

doi:10.5772/859

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Open access peer-reviewed Edited Volume

Recent Advances in Nanofabrication Techniques and Applications

Edited by Bo Cui

University of Waterloo, Canada

Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.

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Recent Advances in Nanofabrication Techniques and ApplicationsEdited by Bo Cui

Published: December 2nd 2011

DOI: 10.5772/859

ISBN: 978-953-307-602-7

eBook (PDF) ISBN: 978-953-51-5554-6

Books open for chapter submissions

97041 Total Chapter Downloads

27 Crossref Citations

80 Web of Science Citations

69 Dimensions Citations

chapters		Downloads
Open access peer-reviewed 1. Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch By Sumio Hosaka		3005
Open access peer-reviewed 2. Focused Ion Beam Lithography By Heinz D. Wanzenboeck and Simon Waid		9850
Open access peer-reviewed 3. Atom Lithography: Fabricating Arrays of Silicon Microstructures Using Self-Assembled Monolayer Resist and Metastable Helium Beam By Jianwu Zhang, Zhongping Wang and Zengming Zhang		2723
Open access peer-reviewed 4. Character Projection Lithography for Application-Specific Integrated Circuits By Makoto Sugihara		2048
Open access peer-reviewed 5. Transform-Based Lossless Image Compression Algorithm for Electron Beam Direct Write Lithography Systems By Jeehong Yang and Serap A. Savari		2030
Open access peer-reviewed 6. Ultrafast Fabrication of Metal Nanostructures Using Pulsed Laser Melting By Bo Cui		2881
Open access peer-reviewed 7. Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale By Andrea Cattoni, Jing Chen, Dominique Decanini, Jian Shi and Anne-Marie Haghiri-Gosnet		3422
Open access peer-reviewed 8. Repairing Nanoimprint Mold Defects by Focused-Ion-Beam Etching and Deposition By Makoto Okada and Shinji Matsui		2470
Open access peer-reviewed 9. Improving the Light-Emitting Efficiency of GaN LEDs Using Nanoimprint Lithography By Yeeu-Chang Lee and Sheng-Han Tu		6901
Open access peer-reviewed 10. Fabrication of Circular Grating Distributed Feedback Dye Laser by Nanoimprint Lithography By Yan Chen, Zhenyu Li, Zhaoyu Zhang and Axel Scherer		2956
Open access peer-reviewed 11. Application of Nanoimprint Lithography to Distributed Feedback Laser Diodes By Masaki Yanagisawa		3029
Open access peer-reviewed 12. Guided-Mode Resonance Filters Fabricated with Soft Lithography By Kyu J. Lee, Jungho Jin, Byeong-Soo Bae and Robert Magnusson		2982
Open access peer-reviewed 13. DUV Interferometry for Micro and Nanopatterned Surfaces By Olivier Soppera, Ali Dirani, Fabrice Stehlin, Hassan Ridaoui, Arnaud Spangenberg, Fernand Wieder and Vincent Roucoules		2464
Open access peer-reviewed 14. Ultrashort Pulsed Lasers – Efficient Tools for Materials Micro-Processing By Marian Zamfirescu, Magdalena Ulmeanu, Alina Bunea, Gheorghe Sajin and Razvan Dabu		2727
Open access peer-reviewed 15. Laser-Based Lithography for Polymeric Nanocomposite Structures By Athanassia Athanassiou, Despina Fragouli, Francesca Villafiorita Monteleone, Athanasios Milionis, Fabrizio Spano, Ilker Bayer and Roberto Cingolani		3109
Open access peer-reviewed 16. Fabrication of 3-D Structures Utilizing Synchrotron Radiation Lithography By Mitsuhiro Horade and Susumu Sugiyama		2416
Open access peer-reviewed 17. Emerging Maskless Nanolithography Based on Novel Diffraction Gratings By Guanxiao Cheng, Yong Yang, Chao Hu, Ping Xu, Helun Song, Tingwen Xing and Max Q.-H. Meng		2301
Open access peer-reviewed 18. Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target By Sho Amano		2360
Open access peer-reviewed 19. Irradiation Effects on EUV Nanolithography Collector Mirrors By J.P. Allain		2891
Open access peer-reviewed 20. High-Index Immersion Lithography By Keita Sakai		3029
Open access peer-reviewed 21. Double Patterning for Memory ICs By Christoph Ludwig and Steffen Meyer		5388
Open access peer-reviewed 22. Diffraction Based Overlay Metrology for Double Patterning Technologies By Prasad Dasari, Jie Li, Jiangtao Hu, Nigel Smith and Oleg Kritsun		4676
Open access peer-reviewed 23. Nanolithography Study Using Scanning Probe Microscope By S. Sadegh Hassani and H. R. Aghabozorg		2860
Open access peer-reviewed 24. Scanning Probe Lithography on Organic Monolayers By SunHyung Lee, Takahiro Ishizaki, Katsuya Teshima, Nagahiro Saito and Osamu Takai		2300
Open access peer-reviewed 25. Controlled Fabrication of Noble Metal Nanomaterials via Nanosphere Lithography and Their Optical Properties By Yujun Song		2369
Open access peer-reviewed 26. A Feasible Routine for Large-Scale Nanopatterning via Nanosphere Lithography By Zhenyang Zhong, Tong Zhou, Yiwei Sun and Jie Lin		2787
Open access peer-reviewed 27. Electrohydrodynamic Inkjet – Micro Pattern Fabrication for Printed Electronics Applications By Kyung-Hyun Choi, Khalid Rahman, Nauman Malik Muhammad, Arshad Khan, Ki-Rin Kwon, Yang-Hoi Doh and Hyung-Chan Kim		6120
Open access peer-reviewed 28. Lithography-Free Nanostructure Fabrication Techniques Utilizing Thin-Film Edges By Hideo Kaiju, Kenji Kondo and Akira Ishibashi		2050
Open access peer-reviewed 29. Extremely Wetting Pattern by Photocatalytic Lithography and Its Application By Yuekun Lai, Changjian Lin and Zhong Chen		2898

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