Open access peer-reviewed Edited Volume

Updates in Advanced Lithography

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Academic Editor

Sumio Hosaka
Sumio Hosaka

Gunma University,
Japan

Published03 July 2013

Doi10.5772/3348

ISBN978-953-51-1175-7

eBook (PDF) ISBN978-953-51-5709-0

Copyright year2013

Number of pages262

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Table of Contents

Open access  chapters

1. Colloidal Lithography

By Ye Yu and Gang Zhang

5,536
5
2. Recent Advances in Two-Photon Stereolithography

By Arnaud Spangenberg, Nelly Hobeika, Fabrice Stehlin, Jean-Pierre Malval, Fernand Wieder, Prem Prabhakaran, Patrice Baldeck and Olivier Soppera

3,744
7
3. Femtosecond Laser Lithography in Organic and Non-Organic Materials

By Florin Jipa, Marian Zamfirescu, Alin Velea, Mihai Popescu and Razvan Dabu

3,417
5
5. Combination of Lithography and Coating Methods for Surface Wetting Control

By Athanasios Milionis, Ilker S. Bayer, Despina Fragouli, Fernando Brandi and Athanassia Athanassiou

4,068
6
6. Resist Homogeneity

By Nima Arjmandi

3,982
3,898
2

IMPACT OF THIS BOOK AND ITS CHAPTERS

40,463 Total Chapter Downloads

4,326 Total Chapter Views

40 Crossref Citations

60 Web of Science Citations

83 Dimensions Citations

7 Altmetric Score

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