Open access

Double Patterning for Memory ICs

Written By

Christoph Ludwig and Steffen Meyer

Submitted: 24 November 2010 Published: 02 December 2011

DOI: 10.5772/23193

From the Edited Volume

Recent Advances in Nanofabrication Techniques and Applications

Edited by Bo Cui

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Written By

Christoph Ludwig and Steffen Meyer

Submitted: 24 November 2010 Published: 02 December 2011