Sumio Hosaka

Gunma University Japan

Sumio Hosaka was born in Japan in 1948. He received a Ph. D. degree in Engineering from Waseda University, Tokyo, in 1983. He joined the Hitachi Central Research Lab. (HCRL), Co. Ltd. Kokubunji, Tokyo in 1971, working in semiconductor lithography using electron, ion, and light beams, nano-metrology using electron beam microscopy and scanning probe microscopy (SPM) techniques, in HCRL and terabyte huge storage using SPM in the Hitachi Advanced Research Lab. (HARL). After he joined the Hitachi Kenki Co., Tsuchiura, Ibaraki in 2000, working in-line atomic force microscope products based on his invention of the first optical lever type atomic force microscope in 1987, he joined to Department of Electronic Engineering, Gunma University, Kiryu, Gunma, in 2001. Today, he works in the Division of Electronics and Informatics, Faculty of Science and Technology at Gunma University. Since 2001, he has been a professor at the university and is working on nanodevices such as quantum conductance atomic switch (QCAS) and phase change memory, nanolithography and fabrication such as EB drawing, self-assembled nanodot arrays and patterned media in huge magnetic storage, and nanometrology based on atomic force controlling, near-field light, Raman spectroscopy and polarized light image in SPM applications.

Sumio Hosaka

1books edited

2chapters authored

Latest work with IntechOpen by Sumio Hosaka

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.

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