Open access peer-reviewed Edited Volume

Plasma Science and Technology

Basic Fundamentals and Modern Applications

Edited by Haikel Jelassi

Centre National des Sciences et Technologies Nucléaires

Co-editor:

Djamel Benredjem

University Paris-Saclay

Usually called the "fourth state of matter," plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science & Technology - Basic Fundamentals and Modern Applications presents the basic fundamentals behind plasma physics along with some of their most important modern applications.

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Plasma Science and TechnologyBasic Fundamentals and Modern ApplicationsEdited by Haikel Jelassi

Published: February 27th 2019

DOI: 10.5772/intechopen.72359

ISBN: 978-1-78985-240-0

Print ISBN: 978-1-78985-239-4

eBook (PDF) ISBN: 978-1-83962-043-0

Copyright year: 2019

Books open for chapter submissions

10158 Total Chapter Downloads

7 Crossref Citations

4 Web of Science Citations

13 Dimensions Citations

chaptersDownloads

Open access peer-reviewed

1. Noise-Free Rapid Approach to Solve Kinetic Equations for Hot Atoms in Fusion Plasmas

By Mikhail Tokar

570

Open access peer-reviewed

2. The Behavior of Streaming Instabilities in Dissipative Plasma

By Eduard V. Rostomyan

550

Open access peer-reviewed

3. Fundamentals of Plasma-Material Interactions in Magnetic Fusion Devices

By Jean Paul Allain and David N. Ruzic

649

Open access peer-reviewed

4. Stopping Power of Ions in a Magnetized Plasma: Binary Collision Formulatio

By Hrachya B. Nersisyan, Günter Zwicknagel and Claude Deutsch

670

Open access peer-reviewed

5. Mode Transition and Hysteresis in Inductively Coupled Plasma Sources

By Shu-Xia Zhao

736

Open access peer-reviewed

6. Numerical Modeling of Partial Discharge Development Process

By Cheng Pan, Ju Tang and Fuping Zeng

768

Open access peer-reviewed

7. Numerical Approach to Dynamical Structure Factor of Dusty Plasmas

By Aamir Shahzad, Muhammad Asif Shakoori, Mao-Gang HE and Yan Feng

499

Open access peer-reviewed

8. A Test Facility to Investigate Sheath Effects during Ion Cyclotron Resonance Heating

By Kristel Crombe, Rodolphe D’ Inca, Eric Faudot, Helmut Faugel, Ana Kostic, Mariia Usoltceva, Jean-Marie Noterdaeme, Anton Nikiforov, Helmut Fuenfgelder, Stephane Heuraux, Jonathan Jacquot, Fabrice Louche, Roman Ochoukov, Ilya Shesterikov and Dirk Van Eester

550

Open access peer-reviewed

9. Plasma-Assisted Combustion

By Siyin Zhou, Haiqing Wang, Wansheng Nie and Xueke Che

724

Open access peer-reviewed

10. Plasma Generation and Application in a Laser Ablation Pulsed Plasma Thruster

By Jianjun Wu, Yu Zhang, Yuqiang Cheng, Qiang Huang, Jian Li and Xiaobin Zhu

497

Open access peer-reviewed

11. Physics of High-Density Radio Frequency Capacitively Coupled Plasma with Various Electrodes and Its Applications

By Yasunori Ohtsu

1135

Open access peer-reviewed

12. Space Plasma Interactions with Spacecraft Materials

By Daniel P. Engelhart, Elena A. Plis, Dale Ferguson, W. Robert Johnston, Russell Cooper and Ryan C. Hoffmann

712

Open access peer-reviewed

13. Repetitive Nanosecond Volume Discharges under Airflows

By Jingfeng Tang, Liqiu Wei and Daren Yu

642

Open access peer-reviewed

14. Modeling of Novel Plasma-Optical Systems

By Iryna Litovko and Alexey Goncharov

517

Open access peer-reviewed

15. Plasma Damage on Low-k Dielectric Materials

By Yi-Lung Cheng, Chih-Yen Lee and Chiao-Wei Haung

952

Edited Volume and chapters are indexed in

  • Worldcat
  • OpenAIRE
  • Google Scholar
  • AZ ebsco
  • Base
  • CNKI

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