Open access peer-reviewed Edited Volume


Edited by Zdravko Stanimirović

Institute for Telecommunications and Electronics IRITEL


Ivanka Stanimirović

Institute for Telecommunications and Electronics IRITEL

To present their work in the field of micromachining, researchers from distant parts of the world have joined their efforts and contributed their ideas according to their interest and engagement. Their articles will give you the opportunity to understand the concepts of micromachining of advanced materials. Surface texturing using pico- and femto-second laser micromachining is presented, as well as the silicon-based micromachining process for flexible electronics. You can learn about the CMOS compatible wet bulk micromachining process for MEMS applications and the physical process and plasma parameters in a radio frequency hybrid plasma system for thin-film production with ion assistance. Last but not least, study on the specific coefficient in the micromachining process and multiscale simulation of influence of surface defects on nanoindentation using quasi-continuum method provides us with an insight in modelling and the simulation of micromachining processes. The editors hope that this book will allow both professionals and readers not involved in the immediate field to understand and enjoy the topic.

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MicromachiningEdited by Zdravko Stanimirović

Published: November 20th 2019

DOI: 10.5772/intechopen.75346

ISBN: 978-1-78923-810-5

Print ISBN: 978-1-78923-809-9

eBook (PDF) ISBN: 978-1-83962-780-4

Copyright year: 2019

Books open for chapter submissions

6225 Total Chapter Downloads

10 Crossref Citations

8 Web of Science Citations

16 Dimensions Citations


Open access peer-reviewed

1. Micromachining of Advanced Materials

By Wayne N.P. Hung and Mike Corliss


Open access peer-reviewed

2. Pico- and Femtosecond Laser Micromachining for Surface Texturing

By Tatsuhiko Aizawa and Tadahiko Inohara


Open access peer-reviewed

3. Silicon-Based Micromachining Process for Flexible Electronics

By Jiye Yang and Tao Wu


Open access peer-reviewed

4. CMOS Compatible Wet Bulk Micromachining for MEMS Applications

By S. Santosh Kumar and Ravindra Mukhiya


Open access peer-reviewed

5. Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

By Elena Kralkina, Andrey Alexandrov, Polina Nekludova, Aleksandr Nikonov, Vladimir Pavlov, Konstantin Vavilin, Vadim Odinokov and Vadim Sologub


Open access peer-reviewed

6. Study on Specific Coefficient in Micromachining Process

By Sung-Hua Wu


Open access peer-reviewed

7. Multiscale Simulation of Surface Defect Influence in Nanoindentation by a Quasi-Continuum Method

By Zhongli Zhang, Yushan Ni, Jinming Zhang, Can Wang and Xuedi Ren


Edited Volume and chapters are indexed in

  • Worldcat
  • OpenAIRE
  • Google Scholar
  • AZ ebsco
  • Base
  • CNKI

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