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Extremely Wetting Pattern by Photocatalytic Lithography and Its Application

By Yuekun Lai, Changjian Lin and Zhong Chen

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Published: December 2nd 2011

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Yuekun Lai, Changjian Lin and Zhong Chen (December 2nd 2011). Extremely Wetting Pattern by Photocatalytic Lithography and Its Application, Recent Advances in Nanofabrication Techniques and Applications Bo Cui, IntechOpen, DOI: 10.5772/20789. Available from:

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