Open access peer-reviewed Edited Volume

Novel Metal Electrodeposition and the Recent Application

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Academic Editor

Masato Sone

Tokyo Institute of Technology

Co-editor

Kazuya Masu

Tokyo Institute of Technology

PublishedMarch 6th, 2019

Doi10.5772/intechopen.73382

ISBN978-1-78985-296-7

Print ISBN978-1-78985-295-0

eBook (PDF) ISBN978-1-83962-063-8

Copyright year2019

Number of pages168

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Edited Volume and chapters are indexed in

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Table of Contents

Open access peer-reviewed  chapters

1,171
4. Pulse-Current Electrodeposition of Gold

By Chun-Yi Chen, Masaharu Yoshiba, Haochun Tang, Tso-Fu Mark Chang, Takashi Nagoshi, Daisuke Yamane, Toshifumi Konishi and Katsuyuki Machida

1,146
5. Electrodeposition of Gold Alloys and the Mechanical Properties

By Haochun Tang, Tso-Fu Mark Chang, Chun-Yi Chen, Takashi Nagoshi, Daisuke Yamane, Toshifumi Konishi and Katsuyuki Machida

1,224
1
7. Electrodeposition of High-Functional Metal Oxide on Noble Metal for MEMS Devices

By Wan-Ting Chiu, Chun-Yi Chen, Tso-Fu Mark Chang, Tomoko Hashimoto and Hiromichi Kurosu

998
8. Multi-Physics Simulation Platform and Multi-Layer Metal Technology for CMOS-MEMS Accelerometer with Gold Proof Mass

By Katsuyuki Machida,Toshifumi Konishi, Daisuke Yamane, Hiroshi Toshiyoshi and Hiroyuki Ito

1,158

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