The hot filament chemical vapor deposition (HFCVD) technique is limited only by the size of the reactor and lends itself to be incorporated into continuous roll-to-roll industrial fabrication processes. We discuss the HFCVD reactor design and the interplay between the reactor parameters, such as filament and substrate temperatures, filament-to-substrate distance, and total pressure. Special attention is given to the large-area synthesis of bilayer graphene on copper, which is successfully grown by HFCVD with transmittance greater than 90% in the visible region and no gaps. We also discuss the HFCVD synthesis of carbon nanotubes, microcrystalline diamond, and nanocrystalline diamond.
Part of the book: Chemical Vapor Deposition