Open access peer-reviewed chapter

Ion Implantation-Induced Layer Splitting of Semiconductors

By U. Dadwal, M. Reiche and R. Singh

Submitted: May 17th 2011Reviewed: February 22nd 2012Published: May 30th 2012

DOI: 10.5772/35956

Downloaded: 2808

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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U. Dadwal, M. Reiche and R. Singh (May 30th 2012). Ion Implantation-Induced Layer Splitting of Semiconductors, Ion Implantation, Mark Goorsky, IntechOpen, DOI: 10.5772/35956. Available from:

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