Chapters authored
Doping of SiC Crystals during Sublimation Growth and Diffusion
The preparation of SiC crystals doped with various impurities introduced during the process of sublimation growth and diffusion is described. The growth of SiC crystals was carried out by a sublimation-sandwich method, proposed by us in 1970. Crystals of the n- and p-type conductivity with maximum content of electrically active impurities (of the order of 1021 cm−3) were obtained. The solubility values of more than 15 impurities were determined. Special tantalum containers with several temperature zones, allowing to introduce any impurity into SiC practically, are developed. The dependences of the impurities concentration on the temperature, growth rate and seed orientation are found. Diffusion of impurities of boron, aluminum, gallium, beryllium, lithium, nitrogen and phosphorus in silicon carbide polytypes was studied. Diffusion coefficients of these impurities in a wide temperature range are determined. It is shown that for a number of impurities diffusion cannot be described by standard distributions that are explained by the presence of several states of diffusing centers. Fast-diffusing states are atoms located in interstices, as well as centers, including the impurity atom and point defect. The extremely low diffusion mobility of lattice point atoms in the SIC lattice is noted.
Part of the book: Crystal Growth