Diamond thin films are touted to be excellent in surface-sensitive sensing, electro-mechanical systems, and electrochemical applications. However, these applications often entail patterned active surfaces and subtle chemical surface modifications. But due to diamond’s intrinsic hardness and chemical inertness, surface patterning (using micro-machining and ion etching) and chemical surface modifications, respectively, are very difficult. In the case of surface patterning, it is even more challenging to obtain patterns during synthesis. In this chapter, the direct patterning of sub-wavelength features on diamond thin film surface using a femtosecond laser, rapid thermal annealing as a means to prepare the diamond thin film surface as an efficient direct charge transfer SERS substrate (in metal/insulator/semiconductor (MIS) configuration), and implantation of 14N+ ions into the surface and sub-surface regions for enhancing the electrical conductivity of diamond thin film to a certain depth (in MIS configuration) will be discussed encompassing the processing strategies and different post-processing characteristics.
Part of the book: Engineering Applications of Diamond