A balanced parameter was proposed to design the high entropy alloys (HEAs), which defined by average melting temperature Tm times entropy of mixing ΔSm over enthalpy of mixing ΔHm, Ω=TmΔSm/ΔHm, if Ω is larger than 1.1, we can predict that the entropy is high enough to overcome the enthalpy, and solid solution is likely to form rather than the intermetallic ordered phases. The composition can be further refined by using high-throughput screening by preparing the compositional gradient films. Multiple targets co-sputtering is usually used to prepare the films, and physical masking can separate the samples independently, chemical masking can also applied if possible. One example is the self-sharpening screening by using nanoindentations, the serration behaviors may related to the self-sharpening compositions.
Part of the book: Advances in High-Entropy Alloys