Open access peer-reviewed chapter

Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas

By Hitoshi Habuka

Submitted: May 27th 2010Reviewed: June 26th 2010Published: April 4th 2011

DOI: 10.5772/14635

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Hitoshi Habuka (April 4th 2011). Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas, Properties and Applications of Silicon Carbide, Rosario Gerhardt, IntechOpen, DOI: 10.5772/14635. Available from:

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