Open access peer-reviewed chapter

The Interdependence of Exposure and Development Conditions when Optimizing Low-Energy EBL for Nano-Scale Resolution

By Mohammad A. Mohammad, Taras Fito, Jiang Chen, Steven Buswell, Mirwais Aktary, Steven K. Dew and Maria Stepanova

Published: February 1st 2010

DOI: 10.5772/8182

Downloaded: 2086

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Mohammad A. Mohammad, Taras Fito, Jiang Chen, Steven Buswell, Mirwais Aktary, Steven K. Dew and Maria Stepanova (February 1st 2010). The Interdependence of Exposure and Development Conditions when Optimizing Low-Energy EBL for Nano-Scale Resolution, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8182. Available from:

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