Open access peer-reviewed Edited Volume


Edited by Michael Wang

University of Miami

Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.

Read more >Order hardcopy
LithographyEdited by Michael Wang

Published: February 1st 2010

DOI: 10.5772/45639

ISBN: 978-953-307-064-3

eBook (PDF) ISBN: 978-953-51-4561-5

Copyright year: 2010

Books open for chapter submissions

132444 Total Chapter Downloads

44 Crossref Citations

103 Web of Science Citations

94 Dimensions Citations


Open access peer-reviewed

1. Direct Laser Lithography and Its Applications

By Hyug-Gyo Rhee


Open access peer-reviewed

2. High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

By Yoshinonori Matsumoto


Open access peer-reviewed

3. Influence of Immersion Lithography on Wafer Edge Defectivity

By K. Jami, I. Pollentier, S. Vedula and G. Blumenstock


Open access peer-reviewed

4. Femtosecond Laser Nonlinear Lithography

By Hiroaki Nishiyama and Yoshinori Hirata


Open access peer-reviewed

5. Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC Optimization

By Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa and Tetsuya Higuchi


Open access peer-reviewed

6. Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

By N.I. Chkhalo, A.E. Pestov, N.N., Salashchenko and M.N. Toropov


Open access peer-reviewed

7. Advances in Resist Materials and Processing Technology: Photonic Devices Fabricated by Direct Lithography of Resist/Colloidal Nanocrystals Blend

By Antonio Qualtieri, Tiziana Stomeo, Luigi Martiradonna, Roberto Cingolani and Massimo De Vittorio


Open access peer-reviewed

8. A Method for Optical Proximity Correction of Thermal Processes: Orthogonal Functional Method

By Sang-Kon Kim


Open access peer-reviewed

9. CO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography

By Akira Endo


Open access peer-reviewed

10. Grazing Incidence Mirrors for EUV Lithography

By Mariana Braic, Mihai Balaceanu and Viorel Braic


Open access peer-reviewed

11. Steady-State and Time-Dependent LPP Modeling

By White, Dunne, and O’Sullivan


Open access peer-reviewed

12. Nano-Crystalline Diamond Films for X-ray Lithography Mask

By Linjun Wang, Jian Huang, Ke Tang and Yiben Xia


Open access peer-reviewed

13. High-energy Electron Beam Lithography for Nanoscale Fabrication

By Cen Shawn Wu, Yoshiyuki Makiuchi and ChiiDong Chen


Open access peer-reviewed

14. Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-Beam Lithography

By Masato Okano


Open access peer-reviewed

15. Independent-Exposure Method in Electron-Beam Lithography

By Do-Kyun Woo and Sun-Kyu Lee


Open access peer-reviewed

16. The Interdependence of Exposure and Development Conditions when Optimizing Low-Energy EBL for Nano-Scale Resolution

By Mohammad A. Mohammad, Taras Fito, Jiang Chen, Steven Buswell, Mirwais Aktary, Steven K. Dew and Maria Stepanova


Open access peer-reviewed

17. Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

By Katia Vutova and Georgi Mladenov


Open access peer-reviewed

18. Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography

By Katia Vutova, Elena Koleva and Georgy Mladenov


Open access peer-reviewed

19. Soft Lithographic Fabrication of Micro Optic and Guided Wave Devices

By Angel Flores and Michael R. Wang


Open access peer-reviewed

20. Application of Soft Lithography for Nano Functional Devices

By Shin-Won Kang


Open access peer-reviewed

21. Fabrication of SiC-based Ceramic Microstructures from Preceramic Polymers with Sacrificial Templates and Softlithography Techniques

By Tae-Ho Yoon, Lan-Young Hong and Dong-Pyo Kim


Open access peer-reviewed

22. Soft Lithography, a Tool to Address Single-Objects Investigations

By Aline Cerf and Christophe Vieu


Open access peer-reviewed

23. Nanoimprint Lithography

By Hongbo Lan and Yucheng Ding


Open access peer-reviewed

24. Nanoimprint Lithography

By Thomas Glinsner and Gerald Kreindl


Open access peer-reviewed

25. Effect of Applying Ultrasonic Vibration in Hot Embossing and Nanoimprint

By Harutaka Mekaru


Open access peer-reviewed

26. Molecular Dynamics Study on Mold and Pattern Breakages in Nanoimprint Lithography

By Masaaki Yasuda, Kazuhiro Tada and Yoshihiko Hirai


Open access peer-reviewed

27. Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist

By Jun Taniguchi and Noriyuki Unno


Open access peer-reviewed

28. Three-Dimensional Patterning Using Ultraviolet Nanoimprint Lithography

By Maan M. Alkaisi and Khairudin Mohamed


Open access peer-reviewed

29. Metal Particle-Surface System for Plasmonic Lithography

By V. M. Murukeshan, K. V. Sreekanth and Jeun Kee Chua


Open access peer-reviewed

30. Nanosphere Lithography for Nitride Semiconductors

By Wai Yuen Fu and Hoi Wai Choi


Open access peer-reviewed

31. Micro- and Nanopatterning of Surfaces Employing Self Assembly of Nanoparticles and Its Application in Biotechnology and Biomedical Engineering

By Claus Burkhardt, Kai Fuchsberger, Wilfried Nisch and Martin Stelzle


Open access peer-reviewed

32. Strategies for High Resolution Patterning of Conducting Polymers

By Lin Jiang and Lifeng Chi


Edited Volume and chapters are indexed in

  • Worldcat
  • OpenAIRE
  • Google Scholar
  • AZ ebsco
  • Base
  • CNKI
  • BKCI

Order a hardcopy of the Edited Volume

Free shipping with DHL Express

Hardcover (ex. VAT)£159

Order now

Residents of European Union countries need to add a Book Value-Added Tax Rate based on their country of residence. Institutions and companies, registered as VAT taxable entities in their own EU member state, will not pay VAT by providing IntechOpen with their VAT registration number. This is made possible by the EU reverse charge method.

Special discount for IntechOpen contributors

All IntechOpen contributors are offered special discounts starting at 40% OFF available through your personal dashboard

Login and purchase