Open access peer-reviewed chapter

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography

By Katia Vutova, Elena Koleva and Georgy Mladenov

Published: February 1st 2010

DOI: 10.5772/8184

Downloaded: 1988

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Katia Vutova, Elena Koleva and Georgy Mladenov (February 1st 2010). Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8184. Available from:

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