Present chapter is organised to give general information about electrolytic coating and electro codeposition, factors affect the coating structure and the main layers’-property relation in details. This relation is expressed by a simple schematic and electrolytic codeposition parameters affect the process such as pH, zeta potential, agitation and etc. are explained. Additionally, in-situ codeposition, the new approach is given with examples, and some experimental results belonging to our research group and with comparison to approaches belonging to some others.
Part of the book: Electrodeposition of Composite Materials
Especially with the development of nanotechnology and polymer science, interest in research and production of both efficient and lower-cost semiconductor thin film materials is increasing day by day. The use of nano-structured thin films for efficient use of solar cells in production of n-type semiconductor materials is one of the most important sources of energy and new-generation energy. Considering the indicated trends and energy requirements, it has been important to transfer this technology in detail regarding the surface technologies related to the semiconductor materials produced with thin film technologies instead of bulk materials. With this aim, this book chapter “Technological Background and Properties of Thin Film Semiconductors” includes a brief story about semiconductors, band gap theory, thin film applications, and besides traditional thin film processing methods finally a new technology called aerosol deposition technique which allows room temperature processing of several materials for semiconductor applications, respectively. It is thought that it will make important contributions to the relevant field and bring a new perspective and direct scientific research in “process-structure–property-performance” relation.
Part of the book: 21st Century Surface Science