Open access peer-reviewed chapter

Etching of Silicon Carbide Using Chlorine Trifluoride Gas

By Hitoshi Habuka

Submitted: March 1st 2012Reviewed: June 2nd 2012Published: October 16th 2012

DOI: 10.5772/50387

Downloaded: 1985

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Hitoshi Habuka (October 16th 2012). Etching of Silicon Carbide Using Chlorine Trifluoride Gas, Physics and Technology of Silicon Carbide Devices, Yasuto Hijikata, IntechOpen, DOI: 10.5772/50387. Available from:

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