Open access peer-reviewed chapter

Effect of Dielectric in a Plasma Annealing System at Atmospheric Pressure

By N.D. Tran , N. Harada, T. Sasaki and T. Kikuchi

Submitted: November 14th 2011Reviewed: June 11th 2012Published: October 3rd 2012

DOI: 10.5772/50594

Downloaded: 1544

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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N.D. Tran , N. Harada, T. Sasaki and T. Kikuchi (October 3rd 2012). Effect of Dielectric in a Plasma Annealing System at Atmospheric Pressure, Dielectric Material Marius Alexandru Silaghi, IntechOpen, DOI: 10.5772/50594. Available from:

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