Open access peer-reviewed Edited volume

Chemical Vapor Deposition

Recent Advances and Applications in Optical, Solar Cells and Solid State Devices

Edited by Sudhir Neralla

Semiconductor Industry

This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

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Chemical Vapor DepositionRecent Advances and Applications in Optical, Solar Cells and Solid State DevicesEdited by Sudhir Neralla

Published: August 31st 2016

DOI: 10.5772/61559

ISBN: 978-953-51-2573-0

Print ISBN: 978-953-51-2572-3

Copyright year: 2016

Books open for chapter submissions

8942 Total Chapter Downloads

1 Crossref Citations

2 Web of Science Citations

10 Dimensions Citations

chaptersDownloads

Open access peer-reviewed

1. Preparation and Characterization of Carbon Nanofibers and its Composites by Chemical Vapor Deposition

By Chang-Seop Lee and Yura Hyun

754

Open access peer-reviewed

2. Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process

By Jae-soo Jung and Nong-moon Hwang

925

Open access peer-reviewed

3. MOCVD Grown HgCdTe Heterostructures

By Pawel Madejczyk, Waldemar Gawron, Artur Keblowski and Adam Piotrowski

806

Open access peer-reviewed

4. Hot Filament Chemical Vapor Deposition: Enabling the Scalable Synthesis of Bilayer Graphene and Other Carbon Materials

By Frank Mendoza, Tej B. Limbu, Brad R. Weiner and Gerardo Morell

842

Open access peer-reviewed

5. In Situ Observation of Chemical Vapour Deposition Using Langasite Crystal Microbalance

By Hitoshi Habuka

637

Open access peer-reviewed

6. Low‐Temperature PureB CVD Technology for CMOS Compatible Photodetectors

By Vahid Mohammadi and Stoyan Nihtianov

755

Open access peer-reviewed

7. Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources

By J. Alarcón-Salazar, R. López-Estopier, E. Quiroga-González, A. Morales-Sánchez, J. Pedraza-Chávez, I. E. Zaldívar-Huerta and M. Aceves-Mijares

673

Open access peer-reviewed

8. High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications

By H. P. Zhou, S. Xu and S. Q. Xiao

675

Open access peer-reviewed

9. Applications of CVD to Produce Thin Films for Solid‐State Devices

By A.M. Torres‐Huerta, M.A. Domínguez‐Crespo and A.B. López‐ Oyama

388

Open access peer-reviewed

10. Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future

By Yasaman Hamedani, Prathyushakrishna Macha, Timothy J. Bunning, Rajesh R. Naik and Milana C. Vasudev

2487

Edited volume and chapters are indexed in

  • Worldcat
  • OpenAIRE
  • Google Scholar
  • AZ ebsco
  • Base
  • CNKI
  • IET Inspec

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