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Lithography
Edited by Michael Wang, ISBN 978-953-307-064-3, Hard cover, 656 pages, Publisher: InTech, Published: February 01, 2010 under CC BY-NC-SA 3.0 license, in subject Electrical and Electronic Engineering
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
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Book contents
- Chapter 1Direct Laser Lithography and Its Applications
- Chapter 2High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure
- Chapter 3Influence of Immersion Lithography on Wafer Edge Defectivity
- Chapter 4Femtosecond Laser Nonlinear Lithography
- Chapter 5Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC Optimization
- Chapter 6Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities
- Chapter 7Advances in Resist Materials and Processing Technology: Photonic Devices Fabricated by Direct Lithography of Resist/Colloidal Nanocrystals Blend
- Chapter 8A Method for Optical Proximity Correction of Thermal Processes: Orthogonal Functional Method
- Chapter 9CO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography
- Chapter 10Grazing Incidence Mirrors for EUV Lithography
- Chapter 11Steady-State and Time-Dependent LPP Modeling
- Chapter 12Nano-Crystalline Diamond Films for X-ray Lithography Mask
- Chapter 13High-energy Electron Beam Lithography for Nanoscale Fabrication
- Chapter 14Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-Beam Lithography
- Chapter 15Independent-Exposure Method in Electron-Beam Lithography
- Chapter 16The Interdependence of Exposure and Development Conditions when Optimizing Low-Energy EBL for Nano-Scale Resolution
- Chapter 17Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography
- Chapter 18Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography
- Chapter 19Soft Lithographic Fabrication of Micro Optic and Guided Wave Devices
- Chapter 20Application of Soft Lithography for Nano Functional Devices
- Chapter 21Fabrication of SiC-based Ceramic Microstructures from Preceramic Polymers with Sacrificial Templates and Softlithography Techniques
- Chapter 22Soft Lithography, a Tool to Address Single-Objects Investigations
- Chapter 23Nanoimprint Lithography
- Chapter 24Nanoimprint Lithography
- Chapter 25Effect of Applying Ultrasonic Vibration in Hot Embossing and Nanoimprint
- Chapter 26Molecular Dynamics Study on Mold and Pattern Breakages in Nanoimprint Lithography
- Chapter 27Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist
- Chapter 28Three-Dimensional Patterning Using Ultraviolet Nanoimprint Lithography
- Chapter 29Metal Particle-Surface System for Plasmonic Lithography
- Chapter 30Nanosphere Lithography for Nitride Semiconductors
- Chapter 31Micro- and Nanopatterning of Surfaces Employing Self Assembly of Nanoparticles and Its Application in Biotechnology and Biomedical Engineering
- Chapter 32Strategies for High Resolution Patterning of Conducting Polymers
