About the book
Two-dimensional structures, thin films, have become the paradigm of today's technology and are one of the most important topics for cutting-edge research groups. Thin films are solid structures, so thin that many physical effects on their thickness can be neglected. Most thin films will interact with waves, so their thickness must be in the order of the wavelength of the disturbance with which they interact. They have been used in different areas, as part of advanced materials, different compositions, polymers, organic and inorganic molecules, membranes, etc. A film is formed when it grows from atoms or molecules that affect the surface of a substrate.
Materials in the form of thin films have been widely used in conductivity or isolation of electronic circuits, in electronic devices, photovoltaics, optical coatings of various areas, in micro and recently in nano-electronics. These films have a thickness ranging from 1-100 nm in nanometric scale.Thin films can be manufactured by different deposit methods depending on the material to be deposited. There are some very specific ones such as magnetic layers, dielectric and ferromagnetic oxides, for semiconductor circuits, polymers, metals, metallic oxides, organic materials, carbon nanotubes, organometallic complexes, among others. Deposit methods are usually divided into physical and chemical. The thermal conductivity and electrical conductivity of thin-film materials is generally smaller than that of their bulk counterparts, sometimes dramatically.
This book welcomes submissions based on this important topic.