Open access peer-reviewed Edited Volume

Atomic Layer Deposition - Recent Advances and Nanotechnology Applications

Pietro Mandracci

Polytechnic University of Turin


Theory of ALD Thin-film Growth Chemistry Low-pressure ALD Reduced-Pressure Atmospheric Pressure ALD High-Pressure Plasma-Assisted ALD Plasma-Enhanced Precursors ALD Advantages ALD Disadvantages

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About the book

Atomic layer deposition (ALD) is a technique with a very long history, but its applications have been limited for a long time, mainly due to its low deposition rate, compared to the thermal CVD and other thin-film growth technologies. However, the rise of nanotechnology has led to the need of deposition techniques able to achieve a high conformality on systems of nanometric size and extremely high aspect ratio, and ALD is the best suited technique to address these needs, due to its peculiar characteristics. In fact, the self-saturating growth process of ALD provides the ability to obtain high conformality, thickness control and composition control at a level that is not achievable using other techniques. While in the past the applications of ALD were limited by the small range of materials that could be grown, the number of chemical compositions that can be obtained has increased considerably in recent years, thus continuously increasing the number of possible applications. Recent research developments have also led to the achievement of ALD processes at atmospheric pressure, characterized by a lower cost and a much higher deposition rate. This book intends to present both fundamental aspects of the ALD process and recent applications, with the aim of presenting a comprehensive review of the recent research developments related to this technique.

Publishing process

Book initiated and editor appointed

Date completed: November 20th 2019

Applications to edit the book are assessed and a suitable editor is selected, at which point the process begins.

Chapter proposals submitted and reviewed

Deadline Extended: Open for Submissions

Potential authors submit chapter proposals ready for review by the academic editor and our publishing review team.

Approved chapters written in full and submitted

Deadline for full chapters: February 9th 2020

Once approved by the academic editor and publishing review team, chapters are written and submitted according to pre-agreed parameters

Full chapters peer reviewed

Review results due: April 29th 2020

Full chapter manuscripts are screened for plagiarism and undergo a Main Editor Peer Review. Results are sent to authors within 30 days of submission, with suggestions for rounds of revisions.

Book compiled, published and promoted

Expected publication date: June 28th 2020

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About the editor

Pietro Mandracci

Polytechnic University of Turin

Pietro Mandracci was born in Torino (Italy) in 1970. He got a Master's Degree in Physics at Torino University in 1996 and a Ph.D. in Electronic Devices at Trento University in 2001. He collaborated with the former Italian Institute for the Physics of Matter, and with the former I.E.N. \G. Ferraris\. From 2004 to 2017 he has been Assistant Professor at Politecnico di Torino and now he is Associated Professor at the same university. His main research interests deal with plasma-assisted surface modification and thin-film/nanostructures growth processes, as well as with their application to nanotechnology and biotechnology.

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Book chapters authored 1

Books edited 2

Introducing your Author Service Manager

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As an Author Service Manager my responsibilities include monitoring and facilitating all publishing activities for authors and editors. From chapter submission and review, to approval and revision, copyediting and design, until final publication, I work closely with authors and editors to ensure a simple and easy publishing process. I maintain constant and effective communication with authors, editors and reviewers, which allows for a level of personal support that enables contributors to fully commit and concentrate on the chapters they are writing, editing, or reviewing. I assist authors in the preparation of their full chapter submissions and track important deadlines and ensure they are met. I help to coordinate internal processes such as linguistic review, and monitor the technical aspects of the process. As an ASM I am also involved in the acquisition of editors. Whether that be identifying an exceptional author and proposing an editorship collaboration, or contacting researchers who would like the opportunity to work with IntechOpen, I establish and help manage author and editor acquisition and contact.

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