Pietro Mandracci

Polytechnic University of Turin Italy

Pietro Mandracci was born in Torino (Italy) in 1970. He got a Master's Degree in Physics at Torino University in 1996 and a Ph.D. in Electronic Devices at Trento University in 2001. He collaborated with the former Italian Institute for the Physics of Matter, and with the former I.E.N. \G. Ferraris\. From 2004 to 2017 he has been Assistant Professor at Politecnico di Torino and now he is Associated Professor at the same university. His main research interests deal with plasma-assisted surface modification and thin-film/nanostructures growth processes, as well as with their application to nanotechnology and biotechnology.

2books edited

1chapters authored

Latest work with IntechOpen by Pietro Mandracci

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

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