There has been continuous progress in the development of different synthesis methods to readily produce graphene at a lower cost. Compared with the other methods, chemical vapor deposition (CVD) is an effective and powerful method of producing graphene and has attracted increased attention during the last decade. In this way, we can obtain good uniformity with a multitude of domains, excellent quality, and large scale of the produced graphene. Meanwhile, it is also helping for large-area synthesis of single-crystal graphene. In the CVD method, precursors are typically absorbed on the surface followed by pyrolytic decomposition, which leads to the generation of absorption sites on the surface and promotes the growth of continuous thin films.
Part of the book: Chemical Vapor Deposition for Nanotechnology