Plasma treatment of graphene oxide (GO) is of interest for many applications such as gas sensors, flexible electrodes, biological applications, supercapacitors, batteries, etc. Plasma treatment is a high-tech process of processing materials in combination with efficiency, economy and environmental friendliness. At the same time, plasma treatments can lead to an increase in the defectiveness of the surface of GO. Therefore, it is important to know how the treatment in various gas media affects the properties of GO. This is necessary for the correct selection of processing parameters in order to reduce the negative impact of plasma treatment. The review presents the results of experimental studies of the effect of plasma in gases of oxygen, nitrogen, ammonia, sulfur hexafluoride, carbon tetrafluoromethane, hydrogen and methane on the properties of GO. Plasma treatments were used for the functionalization, reduction, doping of graphene oxide, and also for the obtaining GO from graphene by oxidation in oxygen plasma. The effects of plasma treatment are largely determined by the type of ions used and processing conditions: plasma power, processing time and temperature, pressure, as well as the location of the samples in the reaction chamber and their distance from the plasma ignition zone.
Part of the book: Graphene Oxide