Simona Condurache-Bota

By Simona Condurache-Bota

Bismuth oxide thin films still prove attractive to both scientists and engineers due to their semiconducting behavior, large energy bandgap and high refractive index, despite their often complex structure, both polymorphic and polycrystalline. We present here a summary and a comparison of the morpho-structural and optical properties of such films prepared through three physical vapor deposition (PVD) techniques on several types of substrates kept at different temperatures. Thermal vapor deposition, thermal oxidation in air and pulsed laser deposition are discussed as largely used PVD methods. It is proved that the physical properties of the bismuth oxide thin films can be tailored by changing the substrate nature and its temperature during the deposition process in a way even more relevant than even the chosen deposition method. Thus, bismuth oxide thin films with energy bandgaps ranging from the infrared up to near-ultraviolet can be obtained, depending on their structure and morphology. High refractive index of the films can be also attained for specific spectral ranges. When deposited on certain conductive substrates, the films have much lower electrical resistance and even became sensitive to water vapor. Therefore, humidity sensing and optoelectronic applications of the analyzed bismuth oxide thin films can be easily found and used in both science and technology.

Part of the book: Bismuth