Oxide molecular beam epitaxy has emerged as an effective technique to fabricate complex oxide thin films and novel superlattices with atomic‐level precision. In this chapter, we first briefly introduce the oxide molecular beam epitaxy technique and then show how to use this technique to achieve high‐quality thin films with good stoichiometry. Moreover, we exhibit that the combination of oxide molecular beam epitaxy and in situ angle‐resolved photoemission spectroscopy is indeed a versatile toolkit to tailor and characterize properties of novel quantum materials.
Part of the book: Modern Technologies for Creating the Thin-film Systems and Coatings