The resent advances in radio frequency (RF)‐magnetron sputtering of hydroxyapatite films are reviewed and challenges posed. The principles underlying RF‐magnetron sputtering used to prepare calcium phosphate‐based, mainly hydroxyapatite coatings, are discussed in this chapter. The fundamental characteristic of the RF‐magnetron sputtering is an energy input into the growing film. In order to tailor the film properties, one has to adjust the energy input into the substrate depending on the desired film properties. The effect of different deposition control parameters, such as deposition time, substrate temperature, and substrate biasing on the hydroxyapatite (HA) film properties is discussed.
Part of the book: Modern Technologies for Creating the Thin-film Systems and Coatings