Thin films of Pt‐YSZ and Pd‐ZrO2 cermets by chemical vapor deposition (CVD) from metallorganic precursors (MOCVD) were evaluated as electrode in solid‐state devices. Morphology and structural characteristics were studied by X‐ray diffraction (XRD), scanning electronic microscopy, atomic force microscopy (AFM), and transmission electronic microscopy (TEM). Electrochemical performance was determined using Tafel and electrochemical impedance spectroscopy methods. Metallorganic precursors were used (metal‐acetylacetonates), and argon and oxygen were used as the carrier and reactive gases, respectively. The particle average size was less than 20 nm, with high and uniform particle dispersion according to TEM measurements.
Part of the book: Chemical Vapor Deposition