Open access

Hafnium-based High-k Gate Dielectrics

Written By

A. P. Huang, Z. C. Yang and Paul K. Chu

Published: 01 April 2010

DOI: 10.5772/8631

From the Edited Volume

Advances in Solid State Circuit Technologies

Edited by Paul K Chu

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Written By

A. P. Huang, Z. C. Yang and Paul K. Chu

Published: 01 April 2010