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A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication

Written By

Hong Shih

Submitted: April 6th, 2011 Published: March 30th, 2012

DOI: 10.5772/31992

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Written By

Hong Shih

Submitted: April 6th, 2011 Published: March 30th, 2012