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Thickness Measurement of Photoresist Thin Films Using Interferometry

Written By

Fotis Kossivas, Charalabos Doumanidis and Andreas Kyprianou

Submitted: May 6th, 2011 Published: March 21st, 2012

DOI: 10.5772/34983

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Written By

Fotis Kossivas, Charalabos Doumanidis and Andreas Kyprianou

Submitted: May 6th, 2011 Published: March 21st, 2012