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Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas

Written By

Hitoshi Habuka

Submitted: 27 May 2010 Published: 04 April 2011

DOI: 10.5772/14635

From the Edited Volume

Properties and Applications of Silicon Carbide

Edited by Rosario Gerhardt

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Written By

Hitoshi Habuka

Submitted: 27 May 2010 Published: 04 April 2011