TY  - CHAP
AU  - Katia Vutova
AU  - Elena Koleva
AU  - Georgy Mladenov
ED  - Michael Wang
Y1  - 2010-02-01
PY  - 2010
T1  - Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography
N2  - Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits.

This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
BT  - Lithography
SP  - Ch. 18
UR  - https://doi.org/10.5772/8184
DO  - 10.5772/8184
SN  - 
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-19
ER  -