TY  - CHAP
AU  - Kristel Crombe
AU  - Rodolphe D’ Inca
AU  - Eric Faudot
AU  - Helmut Faugel
AU  - Ana
Kostic
AU  - Mariia Usoltceva
AU  - Jean-Marie Noterdaeme
AU  - Anton Nikiforov
AU  - 
Helmut Fuenfgelder
AU  - Stephane Heuraux
AU  - Jonathan Jacquot
AU  - Fabrice
Louche
AU  - Roman Ochoukov
AU  - Ilya Shesterikov
AU  - Dirk Van Eester
ED  - Haikel Jelassi
ED  - Djamel Benredjem
Y1  - 2018-11-05
PY  - 2018
T1  - A Test Facility to Investigate Sheath Effects during Ion Cyclotron Resonance Heating
N2  - Usually called the "fourth state of matter," plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science & Technology - Basic Fundamentals and Modern Applications presents the basic fundamentals behind plasma physics along with some of their most important modern applications.
BT  - Plasma Science and Technology
SP  - Ch. 8
UR  - https://doi.org/10.5772/intechopen.76730
DO  - 10.5772/intechopen.76730
SN  - 978-1-78985-240-0
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-19
ER  -