TY  - CHAP
AU  - Vadim Glebovsky
ED  - Kim Ho Yeap
ED  - Humaira Nisar
Y1  - 2017-12-20
PY  - 2017
T1  - High-purity Refractory Metals for Thin Film Metallization of VLSI
N2  - In this book, a variety of topics related to Very-Large-Scale Integration (VLSI) is extensively discussed. The topics encompass the physics of VLSI transistors, the process of integrated chip design and fabrication and the applications of VLSI devices. It is intended to provide information on the latest advancement of VLSI technology to researchers, physicists as well as engineers working in the field of semiconductor manufacturing and VLSI design.
BT  - Very-Large-Scale Integration
SP  - Ch. 4
UR  - https://doi.org/10.5772/intechopen.69126
DO  - 10.5772/intechopen.69126
SN  - 978-953-51-3864-8
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-18
ER  -