TY  - CHAP
AU  - Helena Castán
AU  - Salvador Dueñas
AU  - Alberto Sardiña
AU  - Héctor García
AU  - 
Tõnis Arroval
AU  - Aile Tamm
AU  - Taivo Jõgiaas
AU  - Kaupo Kukli
AU  - Jaan Aarik
ED  - Jagannathan Thirumalai
Y1  - 2017-04-12
PY  - 2017
T1  - RRAM Memories with ALD High-K Dielectrics: Electrical Characterization and Analytical Modeling
N2  - The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science  and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.
BT  - Thin Film Processes
SP  - Ch. 9
UR  - https://doi.org/10.5772/66666
DO  - 10.5772/66666
SN  - 978-953-51-3068-0
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-19
ER  -