TY  - CHAP
AU  - Yasaman Hamedani
AU  - Prathyushakrishna Macha
AU  - Timothy J. Bunning
AU  - 
Rajesh R. Naik
AU  - Milana C. Vasudev
ED  - Sudheer Neralla
Y1  - 2016-08-31
PY  - 2016
T1  - Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future
N2  - This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
BT  - Chemical Vapor Deposition
SP  - Ch. 10
UR  - https://doi.org/10.5772/64654
DO  - 10.5772/64654
SN  - 978-953-51-2573-0
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-05-11
ER  -