TY  - CHAP
AU  - J. Alarcón-Salazar
AU  - R. López-Estopier
AU  - E. Quiroga-González
AU  - A.
Morales-Sánchez
AU  - J. Pedraza-Chávez
AU  - I. E. Zaldívar-Huerta
AU  - M.
Aceves-Mijares
ED  - Sudheer Neralla
Y1  - 2016-08-31
PY  - 2016
T1  - Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources
N2  - This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
BT  - Chemical Vapor Deposition
SP  - Ch. 7
UR  - https://doi.org/10.5772/63012
DO  - 10.5772/63012
SN  - 978-953-51-2573-0
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-26
ER  -