TY  - CHAP
AU  - Claudia Bergemann
AU  - Torsten Gerling
AU  - Cornelia Hoppe
AU  - Maryna
Karmazyna
AU  - Maxi Höntsch
AU  - Martin Eggert
AU  - Barbara Nebe
ED  - Tetsu Mieno
Y1  - 2016-04-20
PY  - 2016
T1  - Physicochemical Analysis of Argon Plasma-Treated Cell Culture Medium
N2  - In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide.
BT  - Plasma Science and Technology
SP  - Ch. 7
UR  - https://doi.org/10.5772/61980
DO  - 10.5772/61980
SN  - 978-953-51-2280-7
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-25
ER  -