TY - CHAP AU - Ye Yu AU - Gang Zhang ED - Sumio Hosaka Y1 - 2013-07-03 PY - 2013 T1 - Colloidal Lithography N2 - Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications. BT - Updates in Advanced Lithography SP - Ch. 1 UR - https://doi.org/10.5772/56576 DO - 10.5772/56576 SN - PB - IntechOpen CY - Rijeka Y2 - 2024-03-28 ER -