TY  - CHAP
AU  - Hong Shih
ED  - Hong Shih
Y1  - 2012-03-30
PY  - 2012
T1  - A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
N2  - The book has covered the state-of-the-art technologies, development, and research progress of corrosion studies in a wide range of research and application fields. The authors have contributed their chapters  on corrosion characterization and corrosion resistance. The applications of corrosion resistance materials will also bring great values to reader's work at different fields. 
In addition to traditional corrosion study, the book also contains chapters dealing with energy, fuel cell, daily life materials, corrosion study in green materials, and in semiconductor industry.
BT  - Corrosion Resistance
SP  - Ch. 1
UR  - https://doi.org/10.5772/31992
DO  - 10.5772/31992
SN  - 
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-05-03
ER  -