TY  - CHAP
AU  - Olivier Soppera
AU  - Ali Dirani
AU  - Fabrice Stehlin
AU  - Hassan Ridaoui
AU  - Arnaud Spangenberg
AU  - Fernand Wieder
AU  - Vincent Roucoules
ED  - Bo Cui
Y1  - 2011-12-02
PY  - 2011
T1  - DUV Interferometry for Micro and Nanopatterned Surfaces
N2  - Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
BT  - Recent Advances in Nanofabrication Techniques and Applications
SP  - Ch. 13
UR  - https://doi.org/10.5772/20896
DO  - 10.5772/20896
SN  - 
PB  - IntechOpen
CY  - Rijeka
Y2  - 2024-04-19
ER  -