@incollection{Vutova10,
author = {Katia Vutova and Elena Koleva and Georgy Mladenov},
title = {Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography},
booktitle = {Lithography},
publisher = {IntechOpen},
address = {Rijeka},
year = {2010},
editor = {Michael Wang},
chapter = {18},
doi = {10.5772/8184},
url = {https://doi.org/10.5772/8184}
}