Open access peer-reviewed chapter

Extremely Wetting Pattern by Photocatalytic Lithography and Its Application

By Yuekun Lai, Changjian Lin and Zhong Chen

Submitted: November 10th 2010Reviewed: April 5th 2011Published: December 2nd 2011

DOI: 10.5772/20789

Downloaded: 2386

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Yuekun Lai, Changjian Lin and Zhong Chen (December 2nd 2011). Extremely Wetting Pattern by Photocatalytic Lithography and Its Application, Recent Advances in Nanofabrication Techniques and Applications Bo Cui, IntechOpen, DOI: 10.5772/20789. Available from:

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