Open access peer-reviewed chapter

Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch

By Sumio Hosaka

Submitted: November 10th 2010Reviewed: August 3rd 2011Published: December 2nd 2011

DOI: 10.5772/20711

Downloaded: 2602

How to cite and reference

Link to this chapter Copy to clipboard

Cite this chapter Copy to clipboard

Sumio Hosaka (December 2nd 2011). Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch, Recent Advances in Nanofabrication Techniques and Applications, Bo Cui, IntechOpen, DOI: 10.5772/20711. Available from:

Embed this chapter on your site Copy to clipboard

<iframe src="http://www.intechopen.com/embed/recent-advances-in-nanofabrication-techniques-and-applications/electron-beam-lithography-for-fine-dot-arrays-with-nanometer-sized-dot-and-pitch" />

Embed this code snippet in the HTML of your website to show this chapter

chapter statistics

2602total chapter downloads

More statistics for editors and authors

Login to your personal dashboard for more detailed statistics on your publications.

Access personal reporting

Related Content

This Book

Recent Advances in Nanofabrication Techniques and Applications

Edited by Bo Cui

Next chapter

Focused Ion Beam Lithography

By Heinz D. Wanzenboeck and Simon Waid

Related Book

First chapter

Liposomes as Potential Drug Carrier Systems for Drug Delivery

By Melis Çağdaş, Ali Demir Sezer and Seyda Bucak

We are IntechOpen, the world's leading publisher of Open Access books. Built by scientists, for scientists. Our readership spans scientists, professors, researchers, librarians, and students, as well as business professionals. We share our knowledge and peer-reveiwed research papers with libraries, scientific and engineering societies, and also work with corporate R&D departments and government entities.

More about us