Open access peer-reviewed chapter

Double Patterning for Memory ICs

By Christoph Ludwig and Steffen Meyer

Submitted: November 24th 2010Reviewed: April 29th 2011Published: December 2nd 2011

DOI: 10.5772/23193

Downloaded: 5405

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Christoph Ludwig and Steffen Meyer (December 2nd 2011). Double Patterning for Memory ICs, Recent Advances in Nanofabrication Techniques and Applications, Bo Cui, IntechOpen, DOI: 10.5772/23193. Available from:

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