Open access peer-reviewed chapter

Double Patterning for Memory ICs

By Christoph Ludwig and Steffen Meyer

Submitted: November 24th 2010Reviewed: April 29th 2011Published: December 2nd 2011

DOI: 10.5772/23193

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Christoph Ludwig and Steffen Meyer (December 2nd 2011). Double Patterning for Memory ICs, Recent Advances in Nanofabrication Techniques and Applications, Bo Cui, IntechOpen, DOI: 10.5772/23193. Available from:

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