Open access peer-reviewed chapter

Diffraction Based Overlay Metrology for Double Patterning Technologies

By Prasad Dasari, Jie Li, Jiangtao Hu, Nigel Smith and Oleg Kritsun

Submitted: November 17th 2010Reviewed: June 5th 2011Published: December 2nd 2011

DOI: 10.5772/21970

Downloaded: 4176

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Prasad Dasari, Jie Li, Jiangtao Hu, Nigel Smith and Oleg Kritsun (December 2nd 2011). Diffraction Based Overlay Metrology for Double Patterning Technologies, Recent Advances in Nanofabrication Techniques and Applications Bo Cui, IntechOpen, DOI: 10.5772/21970. Available from:

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